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Third harmonic generation process in Al doped ZnO thin films

Abd-Lefdil, M and Douayar, A and Belayachi, A and Reshak, A H and Fedorchuk, A O and Pramodini, S and Poornesh, P and Nagaraja, K K and Nagaraja, H S (2014) Third harmonic generation process in Al doped ZnO thin films. Journal of Alloys and Compounds, 584. pp. 7-12.

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Abstract

We have performed studies on the third-order nonlinear optical susceptibility of Al doped ZnO (AZO) thin films using z-scan and third harmonic generation techniques. From the present studies, it reveals that the introduction of Al in ZnO leads to substantial changes in the third-order nonlinear susceptibility. Additionally we have shown that using treatment by the 707 nm laser pulses of the Er:glass 20 ns laser also influence on the third harmonic generation. Such behavior is explained by the photoinduced charge reoccupation f the trapping levels on the borders substrate and ZnO. Further, the sign and magnitude of nonlinear absorption coefficient beff, nonlinear refractive index n2, real and imaginary parts of third-order nonlinear susceptibility were evaluated. Finally, the optical limiting studies for various concentrations of AZO thin films were determined. Reverse saturable absorption was the dominant process leading to the observed nonlinear behavior.

Item Type: Article
Uncontrolled Keywords: Al doped ZnO thin films Laser frequency generation Photoinduced optical devices and electronics Nonlinear optical studies Optical limiting
Subjects: Engineering > MIT Manipal > Physics
Depositing User: MIT Library
Date Deposited: 30 Sep 2013 10:53
Last Modified: 30 Sep 2013 10:53
URI: http://eprints.manipal.edu/id/eprint/137342

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