Influence of electron beam irradiation on nonlinear optical properties of Al doped ZnO thin films for optoelectronic device applications in the cw laser regime

Antony, Albin and Pramodini, S and Poornesh, P and Kityk, I V and Fedorchuk, A O and Sanjeev, Ganesh (2016) Influence of electron beam irradiation on nonlinear optical properties of Al doped ZnO thin films for optoelectronic device applications in the cw laser regime. Optical Materials, 62. pp. 64-71. ISSN 0925-3467

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Abstract

We present the studies on third-order nonlinear optical properties of Al doped ZnO thin films irradiated with electron beam at different dose rate. Al doped ZnO thin films were deposited on a glass substrate by spray pyrolysis deposition technique. The thin films were irradiated using the 8 MeV electron beam from microtron ranging from 1 kG y to 5 kG y. Nonlinear optical studies were carried out by employing the single beam Z-scan technique to determine the sign and magnitude of absorptive and refractive nonlinearities of the irradiated thin films. Continuous wave HeeNe laser operating at 633 nm was used as source of excitation. The open aperture Z-scan measurements indicated the sample displays reverse saturable absorption (RSA) process. The negative sign of the nonlinear refractive index n2 was noted from the closed aperture Z-scan measurements indicates, the films exhibit self-defocusing property due to thermal nonlinearity. The third-order nonlinear optical susceptibility c(3) varies from 8.17 � 10�5 esu to 1.39 � 10�3 esu with increase in electron beam irradiation. The present study reveals that the irradiation of electron beam leads to significant changes in the third-order optical nonlinearity. Al doped ZnO displays good optical power handling capability with optical clamping of about ~5 mW. The irradiation study endorses that the Al doped ZnO under investigation is a promising candidate photonic device applications such as all-optical power limiting.

Item Type: Article
Uncontrolled Keywords: AZO thin films Z-scan Electron beam NLO Optical limiting
Subjects: Engineering > MIT Manipal > Physics
Depositing User: MIT Library
Date Deposited: 02 Dec 2016 14:02
Last Modified: 02 Dec 2016 14:02
URI: http://eprints.manipal.edu/id/eprint/147642

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