Antony, Albin and Muhammed Ali, A V and Gibbiner, Chaya Ravi (2016) Effect of oxygen flow rate on dielectric and structural properties of DC reactive magnetron sputtered ZrO2 grown thin films at. In: CMPA, 23/05/2016, AC seminar Hall, MIT, Manipal.
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Abstract
Zirconium oxide thin films were deposited on the p-type Si substrates by DC reactive magnetron sputtering at room temperature. We investigated the structural, morphological, optical and electrical properties of ZrO2 thin films for gate dielectric a
| Item Type: | Conference or Workshop Item (Paper) |
|---|---|
| Uncontrolled Keywords: | DC reactive sputtering, Zirconium oxide |
| Subjects: | Engineering > MIT Manipal > Physics |
| Depositing User: | MIT Library |
| Date Deposited: | 13 Jan 2017 09:01 |
| Last Modified: | 13 Jan 2017 09:01 |
| URI: | http://eprints.manipal.edu/id/eprint/148075 |
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