Effect of oxygen flow rate on sputtered NiO thin films

Shetty, Arpitha and Gobbiner, Chaya Ravi and Ali, Muhammed A V and Kekuda, Dhananjaya (2016) Effect of oxygen flow rate on sputtered NiO thin films. In: Effect of oxygen flow rate on sputtered NiO thin films, 23/05/2016, AC seminar Hall, MIT, Manipal.

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Abstract

We have studied the dependence of oxygen flow rate on nickel oxide thin films deposited by dc reactive magnetron sputtering at room temperature on glass substrates. The films were deposited by using a pure nickel metallic target was sputtered in th

Item Type: Conference or Workshop Item (Paper)
Uncontrolled Keywords: thin film, Nickel oxide, sputtering
Subjects: Engineering > MIT Manipal > Physics
Depositing User: MIT Library
Date Deposited: 14 Jan 2017 15:02
Last Modified: 14 Jan 2017 15:02
URI: http://eprints.manipal.edu/id/eprint/148135

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