Synthesis of Zinc Oxide thin films

Sindhu, H S and Rajendra, B V and Babu, P D (2016) Synthesis of Zinc Oxide thin films. In: workshop on materials science with neutrons, 03/02/2016, UGC-DAE CSR Mumbai, India.

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Abstract

II- IV compound semiconductor of ZnO is an n-type semiconductor play a vital role in the field of optoelectronic and electronics due to its versatile nature [1]. It has hexagonal (wurtzite) structure with a direct energy band gap of about 3.37 eV at room temperature. The polycrystalline in nature with highly oriented ZnO thin films have low conductivity, which can be used in solar cell manufacturing as transparent and antireflective coatings [4]. There are various techniques to deposit the thin films like RF magnetron sputtering [5], chemical vapour deposition [6] and spray pyrolysis [9]. Among these preparation techniques, spray pyrolysis technique can be adopted for the synthesis ZnO thin films, as the process has many advantages such as better stoichiometry control, better homogeneity, low processing temperature, lower cost, easier fabrication of large area films, possibility of using high purity staring materials and having an easy coating process of large substrate.

Item Type: Conference or Workshop Item (Paper)
Uncontrolled Keywords: ZnO thin films, x-ray diffraction, optical properties
Subjects: Engineering > MIT Manipal > Physics
Depositing User: MIT Library
Date Deposited: 30 Jan 2017 13:32
Last Modified: 30 Jan 2017 13:32
URI: http://eprints.manipal.edu/id/eprint/148221

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