Effect of electron beam on structural, linear and nonlinear properties of nanostructured Fluorine doped ZnO thin films

Antony, Albin and Pramodini, S and Kityk, I V and Lefdil, M Abd and Douayar, A and Moursli, Cherkaoui El F and Sanjeev, Ganesh and Manjunatha, K B and Poornesh, P (2017) Effect of electron beam on structural, linear and nonlinear properties of nanostructured Fluorine doped ZnO thin films. Physica E: Low-Dimensional Systems and Nanostructures, 94 (1). pp. 190-195. ISSN 1386-9477

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Abstract

Electron beam induced effects on Fluorine doped ZnO thin films (FZO) grown by chemical spray pyrolysis deposition technique were studied. The samples were exposed to 8 MeV electron beam at different dose rate ranging from 1 kGy to 4 kGy. All films exhibit a polycrystalline nature which shows an increase in crystallanity with irradiation dosages. The electron beam irradiation effectively controls the films surface morphology and its linear optical characteristics. Z-Scan technique was employed to evaluate the sign and magnitude of nonlinear refractive index and nonlinear absorption coefficient using a continuous wave laser at 632.8 nm as light source. Enhancement in the third order nonlinear optical properties was were noted due to electron beam irradiation. Tailoring the physical and NLO properties by electron beam, the FZO thin films becomes a promising candidate for various optoelectronic applications such as phase change memory devices, optical pulse compression, optical switching and laser pulse narrowing

Item Type: Article
Uncontrolled Keywords: FZO thin films, Electron beam, NLO, Z-scan
Subjects: Engineering > MIT Manipal > Physics
Depositing User: MIT Library
Date Deposited: 05 Oct 2017 11:04
Last Modified: 05 Oct 2017 11:04
URI: http://eprints.manipal.edu/id/eprint/149768

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