Study of micro-structural, optical and electrical properties of TiO2 films obtained from micro-controller based SILAR method

Ashith, V K and Rao, Gowrish K and Smitha, R and Moger, Sahana N (2018) Study of micro-structural, optical and electrical properties of TiO2 films obtained from micro-controller based SILAR method. Ceramics International, 44 (15). pp. 17623-17629. ISSN 0272-8842

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Abstract

The TiO2 films were obtained from successive ion layer adsorption and reaction (SILAR) method. A microcontroller based SILAR unit was used to precisely monitor and control the deposition parameters. The films were uniform and free from physical defects such as pores and cracks. A maximum thickness of about 700 nm was achieved. The films were found to be polycrystalline without any texture or preferred orientations. The crystallite size of the films was found to increase with thickness while the micro strain and stress were found to reduce with the thickness. Post-deposition annealing was also found to produce the similar results. The films were found to possess an indirect bandgap of about 3 eV. Various technically important parameters such as rootmean- square micro strain, Urbach energy, chemical composition, carrier concentration, electrical resistivity etc. were determined. The effects of deposition parameters on the properties of the films is discussed in detail

Item Type: Article
Uncontrolled Keywords: TiO2; SILAR; Bandgap; Urbach energy; Strain
Subjects: Engineering > MIT Manipal > Physics
Depositing User: MIT Library
Date Deposited: 09 Oct 2018 06:45
Last Modified: 09 Oct 2018 06:45
URI: http://eprints.manipal.edu/id/eprint/152082

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