Antony, Albin and Poornesh, P and Ozga, K and Rakus, P and Wojciechowski, A and Kityk, I V and Sanjeev, Ganesh and Petwal, V C and Verma, Vijay Pal and Dwivedi, Jishnu (2019) An electron beam induced study in fluorine doped ZnO nanostructures for optical filtering and frequency conversion application. Optics & Laser Technology, 115 (1). pp. 519-530. ISSN 0030-3992

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Abstract

Influence of high energy electron beam treatment on fluorine doped ZnO (FZO) nanostructures and its role in modifying structural, optical, morphological and nonlinear optical properties was studied. FZO nanostructures weregrownwith different fluorineconcentration usinganairassistedchemicalspraypyrolysistechnique.The preparednanostructuresweretreatedwith8MeVelectronbeamlineatpre-determineddosages(5kGy.10kGy, 15kGy and 20kGy). Compositional and chemical state analysis of FZO films were analyzed by x-ray photoelectron spectroscopy (XPS). The XPS analysis conveys that the percentage area ratio of O1s core level spectra whichattributestooxygenvacancydefectsarereducedfrom28.9%to13.7%whichendorsesafactthate-beam treatment suppresses the generation of oxygen related defects. The glancing angle X-ray diffraction (GAXRD) study confirms that the deposited films exhibit a single phase which point towards the higher order structural stabilityandphasepurityofFZOnanostructuresinintenseradiationenvironment.TheambienttemperaturePL spectra show quenching of radiative defect centers upon electron beam irradiation which infers that non radiativerecombinationpredominatestheradiativerecombinationinthenanostructuresupone-beamtreatment. Open aperture Z-scan analysis shows a magnitude of nonlinear absorption coefficient βeff in the order of 10−1esu. Enhanced third harmonic generation signal (THG) shown by the films due to photoexcitation and relaxation process endorses the credibility of the grown films for application as UV light emitters.

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