The effect of precursor concentration and post-deposition annealing on the optical and micro-structural properties of SILAR deposited SnO2 films

Kumar, Pawan and Rao, Gowrish K (2020) The effect of precursor concentration and post-deposition annealing on the optical and micro-structural properties of SILAR deposited SnO2 films. Materials Research Express, 7. ISSN 2053-1591

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Abstract

Uniform and well-adherent SnO2 thin films, with thickness rangingfrom 60 nm to 6μm, were deposited on borosilicate glass substrate by Successive Ionic Layer Adsorption and Reaction(SILAR)technique. A micro-controlled SILAR unit was employed to precisely monitor the deposition conditions. The effect of precursor concentration and post-deposition annealing on the micro-structural and optical properties of SnO2 thin films were studied in detail. The films werefound to possess tetragonal rutile structure. The crystallite size of the films increased with solution molarity.Microstructural properties were analyzed using Scherrer,Modified Scherrer,Williamsons-Hall and Size-Strain plot techniques. Different optical properties such as band gap, skin depth, extinction coefficient, Urbach energy etc were determined. The postdeposition annealing at amoderate temperature of 573 K wasfound to enhance the crystallite size of the films while the density of the defect energy states reduced

Item Type: Article
Uncontrolled Keywords: : SnO2, SILAR, microstructure, Urbach energy
Subjects: Engineering > MIT Manipal > Physics
Depositing User: MIT Library
Date Deposited: 23 Jun 2020 05:54
Last Modified: 23 Jun 2020 05:54
URI: http://eprints.manipal.edu/id/eprint/155204

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